FUJIMI－日本精密研磨材料
日本FUJIMI公司，拥有世界高科技领域所使用研磨材料最大的市场占有率。在超过半个世纪的光电产业发展中，随着各类新型材料的出现FUJIMI公司针对被加对象各异的理化特性，研发了各类不同的研磨微粉、抛光材料，充分地满足了市场需求。
FUJIMI系列产品，坚持产品的质量与稳定度，广泛地应用于半导体、激光、压电晶学、光学晶体、光学玻璃、光学塑料以至金属、陶瓷加工等行业的高精度表面处理。
| FO 系列研磨粉是以氧化铝、氧化锆等数种磨料依特殊的比例所配制，可使磨削量在不受影向的情况下，避免加工物体产生刮伤现象。广泛应用于半导体材料与各类光玻璃组件。 |
| Quality Standards |
Type | Particle Size | Specific Gravity | Chemical Composition (%) | A1203 | SiO2 | Fe2O3 | TiO2 | ZrO2 | FO | #240-#400 | 3.90 | 45.0 | 20.0 | 0.5 | 2.0 | 38.0 | #500-#1200 | 3.90 | 45.0 | 20.0 | 0.5 | 2.0 | 33.0 | #1500-#4000 | 3.90 | 40.5 | 20.0 | 0.7 | 2.0 | 33.0 |
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| Standard Specification for Particle Size |
Particle
size | Particle distribution (μm) | Packaging | Maximum particle size in (μm) | Particle size at 3% point | Particle size at 50% point | Particle size at 94% point | Stand pack
Net weight (kg) | Vinyl lined Net weight (kg) | # 240 | 98.0 or less | 74.0 or less | 40.0 ± 3.0 | 26.0 or more | 5 | 20 | # 280 | 86.0 | 66.0 | 34.0 ± 2.5 | 21.0 | 5 | 20 | # 320 | 75.0 | 58.0 | 28.0 ± 2.3 | 17.0 | 5 | 20 | # 400 | 63.0 | 50.0 | 23.0 ± 2.1 | 14.0 | 5 | 20 | # 500 | 53.0 | 43.0 | 19.0 ± 1.6 | 12.0 | 5 | 20 | # 600 | 45.0 | 37.0 | 16.0 ± 1.3 | 10.0 | 5 | 20 | # 700 | 38.0 | 31.0 | 13.5 ± 1.1 | 8.0 | 4 | 20 | #800 | 32.0 | 27.0 | 11.3 ± 0.9 | 6.5 | 4 | 20 | # 1000 | 27.0 | 23.0 | 9.4 ± 0.8 | 5.0 | 4 | 10 · 20 | # 1200 | 23.0 | 20.0 | 7.1 ± 0.7 | 4.0 | 4 | 10 · 20 | # 1500 | 19.0 | 17.0 | 5.5 ± 0.5 | 3.0 | 4 | 20 | # 2000 | 15.0 | 14.0 | 4.5 ± 0.4 | 2.0 | 4 | 20 | # 3000 | 12.0 | 11.0 | 3.6 ± 0.4 | 1.5 | 3 | 20 | # 4000 | 10.0 | 8.0 | 2.7 ± 0.4 | 1.3 | 3 | 20 | | ※ Particle size is measured by Electrical sensing zone method. |
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